TITLE:  PHOENICS-CVD Example 3

BY:      J R Heritage, CHAM Consultancy

DATE:  1996            PHOENICS Version:  2.2

PURPOSE OF CALCULATIONS:

To demonstrate the use of the CVD option in PHOENICS.

This is a plasma-enhanced parallel plate reactor for silicon deposition from silane. Three gas-phase and two surface reactions are used; all are plasma-enhanced.

The geometry, velocity vectors and contours of temperature are shown below.