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HEAT-UP OF A SILICON WAFER BATCH IN A PRE-HEATED FURNACE

By: Stefan Poscher, Fraunhofer IIS-B, Erlangen, Germany,

Date: 1998

PHOENICS version: Phoenics-CVD 2.1.3

Description :

Details :

Temperature distribution in the furnace from 0-225s after loading.

 

Center temperature and temperature difference at the middle wafer for various wafer numbers.