LOAD(D100)
      GROUP 1.  Run identifiers and other preliminaries.
TEXT(ASM Single Wafer Si Reactor-Soret  :D102
TITLE
 
  DISPLAY
   This q1 file simulates an ASM single wafer chemical vapour
   deposition reactor using Soret thermal diffusion and Wilke
   diffusion; the reactor is axisymmetric and the geometry was
   provided by TU Delft.
   Laminar, steady-state flow is assumed.
  ENDDIS
 
   ************************************************************
   *
   *  GROUP 19. Data communicated by SATELLITE to GROUND
   *
    ** SPEDAT used for passing options and additional information
    ** to GROUND.
    ** MCDOPT = 2     Wilke Multi-component Diffusion Law
    ** THMDIF = T     Activate Soret Effect (Thermal Diffusion)
    ** THMOPT = 1     Option for thermal diffusion based on Clarke-
    **                Jones formulation using rigid spheres
    **                assumption
    ** THMFRQ = 3     Frequency of thermal diffusion calculation
    **                Calculation for first n sweeps, then every n
    **                sweeps
    ** THMRLX = 1.0   Relaxation factor for thermal diffusion
    **                calculation
SPEDAT(SET,CVD,MCDOPT,I,2)
SPEDAT(SET,CVD,THMDIF,L,T)
SPEDAT(SET,CVD,THMOPT,I,1)
SPEDAT(SET,CVD,THMFRQ,I,3)
SPEDAT(SET,CVD,THMRLX,R,1.0)