LOAD(D100)
      GROUP 1.  Run identifiers and other preliminaries.
TEXT(ASM Single Wafer Si Reactor - S-M  :D101
TITLE
 
  DISPLAY
   This q1 file simulates an ASM single wafer chemical vapour
   deposition reactor using Stefan-Maxwell diffusion; the
   reactor is axisymmetric and the geometry was provided
   by TU Delft.
   Laminar, steady-state flow is assumed.
  ENDDIS
 
   ************************************************************
   *
   *  GROUP 19. Data communicated by SATELLITE to GROUND
   *
    ** SPEDAT used for passing options and additional information
    ** to GROUND.
    ** MCDOPT = 3     Stefan-Maxwell Multi-component Diffusion Law
    ** SMRLX  = 0.5   Relaxation factor for Stefan-Maxwell
SPEDAT(SET,CVD,MCDOPT,I,3)
SPEDAT(SET,CVD,SMRLX,R,0.5)